1100°C Max 8“OD（7.6 L）Vacuum Chamber Furnace 1200X-H8

1100°C Max 8“OD（7.6 L）Vacuum Chamber Furnace 1200X-H8

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Product Description

SN1200X-H8 is a compact vacuum furnace. It equips a 7.5" ID x 13.4"L Quartz tube chamber sitting horizontally. Water-cooled stainless steel vacuum flanges with valves are installed to achieve a vacuum of up to10-5 Torr via turbopump. It is designed for calcining or annealing semiconductor wafers (up to 6") under vacuum or various other gas atmospheres with a temperature of up to 1100°C. It also can also be used as a vacuum brazing furnace for fusing small parts.

Technical Parameter

Item No.	SN1200X-H8
Quartz Tube	Tube size: 8" O.D. x 7.5" I.D x 13.4" L. Heating area: 7.5" ID x 8.5" Depth (7.6Liter) Uniform Temperature zone: 6"Dia x 3.5" depth in center position within +/- 5ºC
Heating Element	Fe-Cr-Al Alloy Doped by Mo
Limted Temperature	1200℃
Max Working Temperature	<= 1000 °C continuously Max. 1100 °C, < 30 minutes Temperature Uniformity: +/- 2°C
Heating Rate	≤20℃/min(suggestion:10℃/min)
Gas Inlet and Outlet & Water cooling	One gas purging inlet (1/4" hose adapter ) with a valve is on the left side of the furnace The inert gas can be introduced into the chamber via the inlet for purging purposes. If a continuous gas flow is needed, refer to the additional gas inlet and thermocouple probe below. A water cooling jacket has been built inside the flange to protect the vacuum sealing O-tings.
Temperature Control	Proportional–integral–derivative control (PID control) and auto-tune function 30 segments programmed with ramping, cooling and dwelling steps Built-in over-temperature alarm and thermocouple failure alarm +/- 1 ºC temperature control accuracy
Temperature Accuracy	±1℃
Power Supply	208~240V AC, Single phase, 50/60 Hz Note： Power cable included, but without the plug